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A theoretical study on electronic structures of metal oxyhalides, their intercalation compounds and vanadium carbide films : Metal oxyhalide와 그들의 intercalation화합물 및 vanadium carbide film의 전자구조에 관한 이론적 연구

DC Field Value Language
dc.contributor.advisor김호징-
dc.contributor.author황승구-
dc.date.accessioned2010-02-22T01:25:08Z-
dc.date.available2010-02-22T01:25:08Z-
dc.date.copyright1995.-
dc.date.issued1995-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000085633eng
dc.identifier.urihttps://hdl.handle.net/10371/56595-
dc.descriptionThesis (doctoral)--서울대학교 대학원 :화학과 물리화학전공,1995.en
dc.format.extentxii, 257 p.en
dc.language.isoenen
dc.publisher서울대학교 대학원en
dc.subjectExtended Huckel tight binding(EHTB) methoden
dc.subjectelectronic structureen
dc.subjectMMen
dc.subjectMDen
dc.subjectmetal oxyhalideen
dc.titleA theoretical study on electronic structures of metal oxyhalides, their intercalation compounds and vanadium carbide filmsen
dc.title.alternativeMetal oxyhalide와 그들의 intercalation화합물 및 vanadium carbide film의 전자구조에 관한 이론적 연구-
dc.typeThesis-
dc.contributor.department화학과 물리화학전공-
dc.description.degreeDoctoren
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