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실리콘 산화막 식각반응기구 및 식각단면 모사에 관한 연구 : A Study on the surface-reaction mechanism of the silicon oxide and the silmulation of the etched surface
DC Field | Value | Language |
---|---|---|
dc.contributor.advisor | 문상흡 | - |
dc.contributor.author | 김일욱 | - |
dc.date.accessioned | 2010-03-09T23:48:03Z | - |
dc.date.available | 2010-03-09T23:48:03Z | - |
dc.date.copyright | 1997. | - |
dc.date.issued | 1997 | - |
dc.identifier.uri | http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000079018 | kog |
dc.identifier.uri | https://hdl.handle.net/10371/59472 | - |
dc.description | 학위논문(박사)--서울대학교 대학원 :화학공학과,1997. | ko |
dc.format.extent | xii, 167 장 | ko |
dc.language.iso | ko | ko |
dc.publisher | 서울대학교 대학원 | ko |
dc.subject | 프라즈마 | ko |
dc.subject | plasma | ko |
dc.subject | 프라즈마 상태함수 | ko |
dc.subject | MERIE | ko |
dc.subject | 특정 식각수율 | ko |
dc.subject | plasma-state function | ko |
dc.subject | specific etch yield | ko |
dc.subject | RIE Lag | ko |
dc.title | 실리콘 산화막 식각반응기구 및 식각단면 모사에 관한 연구 | ko |
dc.title.alternative | A Study on the surface-reaction mechanism of the silicon oxide and the silmulation of the etched surface | ko |
dc.type | Thesis | - |
dc.contributor.department | 화학공학과 | - |
dc.description.degree | Doctor | ko |
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