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The role of surface species in low-temperature silicon CVD : 저온 실리콘 화학증착공정에서의 표면 흡착종의 역할에 관한 연구

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Authors

정찬화

Advisor
문상흡
Issue Date
1995
Publisher
서울대학교 대학원
Keywords
in-situ FTIRSiH₂F₂저온(250℃)산화막 억제결정성 실리콘
Description
Thesis (doctoral)--서울대학교 대학원 :화학공학과,1995.
Language
English
URI
http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000085601

https://hdl.handle.net/10371/59486
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