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The role of surface species in low-temperature silicon CVD : 저온 실리콘 화학증착공정에서의 표면 흡착종의 역할에 관한 연구
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- Authors
- Advisor
- 문상흡
- Issue Date
- 1995
- Publisher
- 서울대학교 대학원
- Keywords
- in-situ FTIR ; SiH₂F₂ ; 저온(250℃) ; 산화막 억제 ; 결정성 실리콘
- Description
- Thesis (doctoral)--서울대학교 대학원 :화학공학과,1995.
- Language
- English
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000085601
https://hdl.handle.net/10371/59486
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