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Si 및 BST 박막 제조를 위한 화학 증착 공정에서 반응물의 분해 특성에 관한 연구 : A Study on the decomposition characteristics of the reactants used in the chemical vapor deposition processes of Si and BST
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- Authors
- Advisor
- 문상흡
- Issue Date
- 1996
- Publisher
- 서울대학교 대학원
- Keywords
- chemical vapor deposition ; 화학 증착법 ; silicon ; 실리콘 ; BST ; 반응 기구 ; reaction mechanism ; 질량 분석기 ; SiH₄ ; FTIR
- Description
- 학위논문(박사)--서울대학교 대학원 :화학공학과,1996.
- Language
- Korean
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000081641
https://hdl.handle.net/10371/59490
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