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Capillary Force Lithography

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Authors
Suh, Kahp Y.; Kim, Yun S.; Lee, Hong H.
Issue Date
2001-09-05
Publisher
John Wiley & Sons
Citation
Adv. Mater. 2001, 13, 1386
Keywords
Block copolymersLithography, capillary forcePolystyreneSurface patterning
Abstract
A simple yet robust method for large-area patterning of polymer films - capillary force lithography - is presented here. This method, which combines the essential features of imprint lithography and microcontact printing, allows the replication of features down to 100 nm. The Figure shows a typical pattern.
ISSN
0935-9648 (print)
1521-4095 (online)
Language
English
URI
https://hdl.handle.net/10371/6136
DOI
https://doi.org/10.1002/1521-4095(200109)13:18<1386::AID-ADMA1386>3.0.CO;2-X
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Mechanical Aerospace Engineering (기계항공공학부)Journal Papers (저널논문_기계항공공학부)
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