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Compensation effect in the rate of solid-phase epitaxial growth of Si1-xGex alloys

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Authors

Suh, K. Y.; Lee, Hong H.

Issue Date
1997-05-15
Publisher
American Institute of Physics
Citation
J. Appl. Phys. 81, 7067 (1997)
Keywords
KINETICS
Abstract
The compensation effect, well known in catalytic reactions, is shown to apply equally well to the solid-phase epitaxial (SPE) growth of Si1-xGex alloys. A linear relationship exists between the logarithm of the pre-exponential factor and the activation energy of the SPE growth rate. This linear relationship, together with the activation energy obtained earlier, enables one to completely describe the growth rate of Si1-xGex alloys. The effect holds for both strained and unstrained SPE. The model is applicable to other binary alloys.
ISSN
0021-8979
Language
English
URI
https://hdl.handle.net/10371/6246
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