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Capillary force lithography: Large-area patterning, self-organization, and anisotropic dewetting
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Suh, K. Y. | - |
dc.contributor.author | Lee, Hong H. | - |
dc.date.accessioned | 2009-08-06T06:24:48Z | - |
dc.date.available | 2009-08-06T06:24:48Z | - |
dc.date.issued | 2002-06 | - |
dc.identifier.citation | Adv. Funct. Mater. 2002, 12, 405 | en |
dc.identifier.issn | 1616-301X | - |
dc.identifier.uri | https://hdl.handle.net/10371/6273 | - |
dc.description.abstract | This article gives an overview on a new lithographic technique called capillary force lithography for large-area patterning. The technique simply involves placing a polydimethylsiloxane model on a polymer film, which is then heated above the glass-transition temperature of the polymer. Various useful microstructures can be obtained by sequential applications of the technique through self-organization. Dewetting, which can be observed in capillary force lithography for relatively thin films, is also described as a new pathway for realizing anisotropic dewetting. | en |
dc.language.iso | en | en |
dc.publisher | John Wiley & Sons | en |
dc.subject | THIN POLYMER-FILMS | en |
dc.subject | TEMPERATURE IMPRINT LITHOGRAPHY | en |
dc.subject | ASSEMBLED MONOLAYERS | en |
dc.subject | SURFACES | en |
dc.subject | MICROSTRUCTURES | en |
dc.subject | Anisotropic dewetting | en |
dc.subject | Lithography capillary force | en |
dc.subject | Patterning 3D | en |
dc.subject | Poly(dimethylsiloxanes) (PDMS) | en |
dc.title | Capillary force lithography: Large-area patterning, self-organization, and anisotropic dewetting | en |
dc.type | Article | en |
dc.identifier.doi | 10.1002/1616-3028(20020618)12:6/7<405::AID-ADFM405>3.0.CO;2-1 | - |
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