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Observation of High-Aspect-Ratio Nanostructures Using Capillary Lithography
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Suh, Kahp Y. | - |
dc.contributor.author | Choi, Se-Jin | - |
dc.contributor.author | Baek, Seung J. | - |
dc.contributor.author | Kim, Tae W. | - |
dc.contributor.author | Langer, Robert | - |
dc.date.accessioned | 2009-08-07T07:50:16Z | - |
dc.date.available | 2009-08-07T07:50:16Z | - |
dc.date.issued | 2005-03-03 | - |
dc.identifier.citation | Adv. Mater. 2005, 17, 560 | en |
dc.identifier.issn | 0935-9648 (print) | - |
dc.identifier.issn | 1521-4095 (online) | - |
dc.identifier.uri | https://hdl.handle.net/10371/6535 | - |
dc.description.abstract | Several intriguing nanostructures, such as mushroom-like nanopillars, vertical nanopillars (see Figure), and nanospheres, are made using capillary lithography and a new, UV-curable mold consisting of polyurethane functionalized with an acrylate group. An aspect ratio as high as five is achieved for nanopillars 90 nm in diameter. | en |
dc.description.sponsorship | This research was supported by a grant (04K1401-01710) from the Conter for Nanoscale Mechatronics & Manufacturing, one of the 21th Century Frontier Research Programs, which are supported by Ministry of Science and Technology, Korea. This work was also supported in part by the Micro Thermal System Research Conter of Seoul National University. | en |
dc.language.iso | en | - |
dc.publisher | John Wiley & Sons | en |
dc.subject | SOFT LITHOGRAPHY | en |
dc.subject | FORCE LITHOGRAPHY | en |
dc.subject | STAMPS | en |
dc.subject | MICROSTRUCTURES | en |
dc.subject | RESOLUTION | en |
dc.subject | POLY(DIMETHYLSILOXANE) | en |
dc.subject | FABRICATION | en |
dc.subject | STABILITY | en |
dc.subject | CRYSTAL | en |
dc.title | Observation of High-Aspect-Ratio Nanostructures Using Capillary Lithography | en |
dc.type | Article | en |
dc.contributor.AlternativeAuthor | 서갑양 | - |
dc.contributor.AlternativeAuthor | 최세진 | - |
dc.identifier.doi | 10.1002/adma.200401089 | - |
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