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Atomic oxygen generation by in-situ plasma and post-plasma in dielectric barrier discharges for surface treatment

Cited 7 time in Web of Science Cited 8 time in Scopus
Authors
Kang, Woo Seok; Kim, Hyun-Su; Hong, Sang Hee
Issue Date
2010-09-01
Publisher
Elsevier
Citation
Thin Solid Films 518 6578-6562 (2010)
Keywords
dielectric barrier dischargein-situ plasmapost-plasmaatomic oxygenoptical actinometryNO titrationnumerical simulation
Abstract
Atomic oxygen (AO) generation is experimentally and numerically investigated for in-situ plasma and post-plasma produced by dielectric barrier discharges (DBDs) for surface treatment. The AO generation in in-situ plasma inside a DBD reactor is closely related to the plasma characteristics depending on the applied voltage and O2 additive concentration, while the AO density distribution along the post-plasma ejected outside the reactor exit is influenced by the AO generation in the in-situ plasma, gas flow rate, and effluent distance. Contact angle measurements show that the metal surface characteristics, which are treated by in-situ plasma and post-plasma, respectively, are distinctive from each other depending on the AO densities.
ISSN
0040-6090
Language
English
URI
https://hdl.handle.net/10371/69363
DOI
https://doi.org/10.1016/j.tsf.2010.04.045
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Energy Systems Engineering (에너지시스템공학부)Nuclear Engineering (원자핵공학전공)Journal Papers (저널논문_원자핵공학과)
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