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Fabrication of multimode polymeric waveguides and micromirrors using deep x-ray lithography
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Joon-Sung | - |
dc.contributor.author | Kim, Jang-Joo | - |
dc.date.accessioned | 2009-08-12T23:17:02Z | - |
dc.date.available | 2009-08-12T23:17:02Z | - |
dc.date.issued | 2004-03 | - |
dc.identifier.citation | IEEE Photon. Technol. Lett., vol. 16, pp. 798-800, Mar. 2004 | en |
dc.identifier.issn | 1041-1135 | - |
dc.identifier.uri | https://hdl.handle.net/10371/7080 | - |
dc.description.abstract | Multimode polymeric waveguides and 45° micromirrors have been fabricated using deep X-ray lithography. Polymethylmetacrylate was used as a core layer and silica and silicone elastomer as a lower and upper cladding layer, respectively. The propagation loss of the waveguide was 0.54 dB/cm at 830 nm and the loss of micromirrors was less than 0.43 dB at the wavelength. The X-ray lithography technique offers the controllability of mirror angles to 45° and -45° so that it gives flexibility to the system architecture of optical interconnections. | en |
dc.language.iso | en | - |
dc.publisher | Institute of Electrical and Electronics Engineers (IEEE) | en |
dc.subject | X-ray lithography | en |
dc.subject | elastomers | en |
dc.subject | micromirrors | en |
dc.subject | optical fabrication | en |
dc.subject | optical interconnections | en |
dc.subject | optical losses | en |
dc.subject | optical polymers | en |
dc.subject | optical waveguides | en |
dc.subject | polymeric multimode waveguide | en |
dc.title | Fabrication of multimode polymeric waveguides and micromirrors using deep x-ray lithography | en |
dc.type | Article | en |
dc.contributor.AlternativeAuthor | 김준성 | - |
dc.contributor.AlternativeAuthor | 김장주 | - |
dc.identifier.doi | 10.1109/LPT.2004.823694 | - |
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