Publications
Detailed Information
Fabrication of high aspect ratio nanostructures using capillary force lithography
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Suh, Kahp Yang | - |
dc.contributor.author | Jeong, Hoon Eui | - |
dc.contributor.author | Park, Jee Won | - |
dc.contributor.author | Lee, Sung Hoon | - |
dc.contributor.author | Kim, Jae Kwan | - |
dc.date.accessioned | 2009-08-23T23:04:11Z | - |
dc.date.available | 2009-08-23T23:04:11Z | - |
dc.date.issued | 2006-07 | - |
dc.identifier.citation | Korean J. Chem. Eng., 23, 678 (2006) | en |
dc.identifier.issn | 0256-1115 (print) | - |
dc.identifier.issn | 1975-7220 (online) | - |
dc.identifier.uri | https://hdl.handle.net/10371/7497 | - |
dc.description.abstract | A new ultraviolet (UV) curable mold consisting of fanctionalized polyurethane with acrylate group (MINS101m, Minuta Tech.) has recently been introduced as an alternative to replace polydimethylsiloxane (PDMS) mold for sub-100-nm lithography. Here, we demonstrate that this mold allows for fabrication of various high aspect ratio nanostructures with an aspect ratio as high as 4.4 for 80 nm nanopillars. For the patterning method, we used capillary force lithography (CFL) involving direct placement of a polyurethane acrylate mold onto a spin-coated polymer film followed by raising the temperature above the glass transition temperature of the polymer (T). For the patterning materials, thermoplastic resins such as polystyrene (PS) and poly(methyl methacrylate) (PMMA) and a zinc oxide (ZnO) precursor were used. For the polymer, micro/nanoscale hierarchical structures were fabricated by using sequential application of the same method, which is potentially useful for mimicking functional surfaces such as lotus leaf. | en |
dc.description.sponsorship | This work was supported by the Ministry of Science and Technology through the Nanoscopia Center of Excellence at Seoul National University and supported in part by the Micro Thermal System Research Center of Seoul National University. | en |
dc.language.iso | en | en |
dc.publisher | 한국화학공학회 = Korean Institute of Chemical Engineers (KIChE); Springer Verlag | en |
dc.subject | capillary force lithography | en |
dc.subject | nanostructures | en |
dc.subject | aspect ratio | en |
dc.subject | laplace pressure | en |
dc.subject | SOFT LITHOGRAPHY | en |
dc.subject | NANOIMPRINT LITHOGRAPHY | en |
dc.subject | STAMPS | en |
dc.subject | MICROSTRUCTURES | en |
dc.subject | RESOLUTION | en |
dc.subject | SI | en |
dc.subject | STABILITY | en |
dc.subject | SURFACES | en |
dc.subject | CRYSTAL | en |
dc.subject | LASER | en |
dc.title | Fabrication of high aspect ratio nanostructures using capillary force lithography | en |
dc.type | Article | en |
dc.contributor.AlternativeAuthor | 서갑양 | - |
dc.contributor.AlternativeAuthor | 정훈의 | - |
dc.contributor.AlternativeAuthor | 박지원 | - |
dc.contributor.AlternativeAuthor | 이성훈 | - |
dc.contributor.AlternativeAuthor | 김재관 | - |
dc.identifier.doi | 10.1007/BF02706814 | - |
- Appears in Collections:
- Files in This Item:
- There are no files associated with this item.
Item View & Download Count
Items in S-Space are protected by copyright, with all rights reserved, unless otherwise indicated.