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Inorganic polymer photoresist for direct ceramic patterning by photolithography
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Pham, Tuan Anh | - |
| dc.contributor.author | Kim, Pilnam | - |
| dc.contributor.author | Kwak, MoonKyoo | - |
| dc.contributor.author | Suh, Kahp Y. | - |
| dc.contributor.author | Kim, Dong-Pyo | - |
| dc.date.accessioned | 2009-09-01T03:50:32Z | - |
| dc.date.available | 2009-09-01T03:50:32Z | - |
| dc.date.issued | 2007 | - |
| dc.identifier.citation | Chem. Commun., 2007, 39, 4021 | en |
| dc.identifier.issn | 1359-7345 | - |
| dc.identifier.uri | https://hdl.handle.net/10371/8379 | - |
| dc.description.abstract | A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800 degrees C. | en |
| dc.description.sponsorship | The authors acknowledge the National Research Laboratory (M10400000367-06J0000-36710) for financial support. Especially,
the authors want to thank KBSI and KAIST for SEM and TEM support. K. Y. Suh is grateful for financial support from theMicro Thermal System Research Center of Seoul National University. | en |
| dc.language.iso | en | en |
| dc.publisher | Royal Society of Chemistry | en |
| dc.subject | SICN MEMS | en |
| dc.subject | FABRICATION | en |
| dc.subject | MICROSTRUCTURES | en |
| dc.subject | COMPOSITES | en |
| dc.title | Inorganic polymer photoresist for direct ceramic patterning by photolithography | en |
| dc.type | Article | en |
| dc.contributor.AlternativeAuthor | 김필남 | - |
| dc.contributor.AlternativeAuthor | 곽문규 | - |
| dc.contributor.AlternativeAuthor | 서갑양 | - |
| dc.contributor.AlternativeAuthor | 김동효 | - |
| dc.identifier.doi | 10.1039/b708480c | - |
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