S-Space College of Engineering/Engineering Practice School (공과대학/대학원) Dept. of Electrical and Computer Engineering (전기·정보공학부) Journal Papers (저널논문_전기·정보공학부)
A Simultaneous Multichannel Recording Obtained from Rat Cortex Using a Plasma Etched Silicon Depth Probe
- Hwang, E.; Kim, Sung June; Yoon, T.; Shin, D.; Oh, S.; Jung, S.; Shin, H.
- Issue Date
- 1999 BMES -IEEE EMBS Joint Conference, vol. 1, p. 380, Atlanta, USA, Oct. 1999
- Combination of plasma and wet etching was done in developing a new silicon depth-probe type microelectrode array. The plasma etch uses low temperature oxide (LTO) mask instead of thick photoresist mask, and enables the thickness of the probe shank to be defined more freely and in wider range. The entire probe shaping process was performed only at low temperature, and is CMOS compatible. A probe with 30 μm shank thickness was successfully used in recording from rat's somatosensory cortex. A four-channel simultaneous neural recording shows signal-to-noise ratio performance comparable with that obtained using conventional microprobes.