On the role of surface tensions and process conditions in detachment nanolithography

Abstract

We report on the role of intrinsic (adhesion force and wettability) and extrinsic (temperature and pressure) conditions to fabricate dense nanoscale patterns in detachment nanolithography. A phase diagram is constructed by using a rigiflex polymeric mold, an organic film, and silicon or gold substrate. Operating conditions in terms of surface tensions and processing parameters are discussed along with comparison of the minimum resolution with a simple theory.