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Issue Date	Title / Author(s) / Citation	File	Altmetrics
2018-12	Real- time Etch Control to Reduce First Wafer Effect in SF6/O-2/Ar Plasma Ryu, Sangwon; Jang, Yunchang; Kwon, Ji-Won; Park, Damdae; Lee, JongMin; Kim, Gon-Ho 2018 INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING (ISSM), p. 8651157	DOI
2019-04	Design of a self-tuning adaptive model predictive controller using recursive model parameter estimation for real-time plasma variable control Koo, Junmo; Park, Damdae; Ryu, Sangwon; Kim, Gon-Ho; Lee, Youn-Woo Computers and Chemical Engineering, Vol.123, pp.126-142	DOI