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Generation and Self-Replication of Monolithic, Dual-Scale Polymer Structures by Two-Step Capillary-Force Lithography

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dc.contributor.authorJeong, Hoon Eui-
dc.contributor.authorKwak, Rhokyun-
dc.contributor.authorKim, Jae Kwan-
dc.contributor.authorSuh, Kahp Y.-
dc.date.accessioned2009-09-16T23:48:47Z-
dc.date.available2009-09-16T23:48:47Z-
dc.date.issued2008-11-
dc.identifier.citationSmall 2008, 4, 1913en
dc.identifier.issn1613-6810-
dc.identifier.urihttps://hdl.handle.net/10371/9625-
dc.description.abstractInhibition effects in UV radiation curing caused by oxygen are used for fabricating monolithic, micro/nanoscale hierarchical polymer structures via a two-step UV-assisted capillary molding technique (see image). Using this approach, various dual-scale polymer structures are created within a few minutes with precise control over geometrical parameters.en
dc.description.sponsorshipThis work was supported by the Korea Science & Engineering Foundation through the Nano R&D Program (Grant 2007-02605). This work was also supported in part by the Micro Thermal System Research Center of Seoul National University and the Korea Institute of Machinery & Materials.en
dc.language.isoenen
dc.publisherWiley-Blackwellen
dc.subjectcapillary-force lithographyen
dc.subjectdual-structure surfacesen
dc.subjectmicrostructuresen
dc.subjectnanostructuresen
dc.subjectSUPER-HYDROPHOBIC SURFACEen
dc.subjectSUPERHYDROPHOBIC SURFACEen
dc.subjectIMPRINT LITHOGRAPHYen
dc.subjectACRYLATE COATINGSen
dc.subjectOXYGEN INHIBITIONen
dc.subjectNANOSTRUCTURESen
dc.subjectMICROen
dc.subjectFABRICATIONen
dc.subjectDEPOSITIONen
dc.subjectCREATIONen
dc.titleGeneration and Self-Replication of Monolithic, Dual-Scale Polymer Structures by Two-Step Capillary-Force Lithographyen
dc.typeArticleen
dc.contributor.AlternativeAuthor정훈의-
dc.contributor.AlternativeAuthor곽노균-
dc.contributor.AlternativeAuthor김재관-
dc.contributor.AlternativeAuthor서갑양-
dc.identifier.doi10.1002/smll.200800151-
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