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Study on the initial stage of Ru growth by atomic layer deposition for nonvolatile memory application : 단원자층 증착법을 이용한 루세늄 초기 성장과정에 대한 연구
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- Authors
- Advisor
- 김기범
- Issue Date
- 2008
- Publisher
- 서울대학교 대학원
- Keywords
- 단원자층증착 ; atomic layer deposition ; 루세늄 ; Ru ; 핵생성 ; nucleation and growth ; 핵성장 ; nonvolatile memory ; 비휘발성 메모리 ; nanocrystal floating gate memory ; 나노결정 부유게이트 메모리 ; aluminum oxide ; 산화알루미늄 ; electron tunneling. ; 전자 터널링
- Description
- Thesis(doctors) --서울대학교 대학원 :재료공학부,2008.8.
- Language
- English
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000041522
https://hdl.handle.net/10371/13637
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