Publications

Detailed Information

A Study on the improvement of grain microstructure and device characteristics of polycrystalline silicon thin film transistor employing excimer laser annealing : 多結晶 실리콘 薄膜 素子의 그레인 微細 構造 및 特性 向上을 위한 엑시머 레이저 어닐링 方法에 關한 硏究

Cited 0 time in Web of Science Cited 0 time in Scopus

Altmetrics

Item View & Download Count

  • mendeley

Items in S-Space are protected by copyright, with all rights reserved, unless otherwise indicated.

Share