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Controlled selective growth of ZnO nanorod and microrod arrays on Si substrates by a wet chemical method

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Authors
Kim, Yong-Jin; Lee, Chul-Ho; Hong, Young Joon; Yi, Gyu-Chul; Kim, Sung Soo; Cheong, Hyeonsik
Issue Date
2006-10-20
Publisher
American Institute of Physics
Citation
Appl. Phys. Lett. 89, 163128 (2006)
Abstract
The use of a wet chemical method to selectively grow ZnO microrod and nanorod arrays on Si substrates is described. To control the size and position of the ZnO microrods and nanorods, polymethylmethacrylate PMMA submicron patterns were prepared on the Si substrates with an intermediate ZnO layer using e-beam lithography. Selective growth of the ZnO structures was achieved by the absence of ZnO nucleation sites on the PMMA mask, resulting in position-controlled growth of ZnO structures only on patterned holes where the ZnO layer was exposed. In addition, the diameters of the ZnO microrods were determined by the patterned hole size, and the diameters as small as 250 nm were obtained when a hole diameter of 250 nm was employed. The structural and optical characteristics of the ZnO microrods were further investigated using x-ray diffraction, transmission
ISSN
0003-6951 (print)1077-3118 (online)
Language
English
URI
http://link.aip.org/link/?APPLAB/89/163128/1
http://hdl.handle.net/10371/5407
DOI
https://doi.org/10.1063/1.2364162
https://doi.org/10.1063/1.2364162
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College of Natural Sciences (자연과학대학)Dept. of Physics and Astronomy (물리·천문학부)Physics (물리학전공)Journal Papers (저널논문_물리학전공)
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