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Low Dielectric Nanoporous Poly(methylsilsesquioxane) (PMSSQ) Films via Inorganic/Organic Hybrids

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Authors
Lee, Dong Jun; Kim, Kwang Hun; Kim, Sung Kyu; Kim, Byoung Suhk; Rhee, Hee-Woo; Jin, Moon Young; Lee, Jin-Kyu; Yoon, Do Yeung; Char, Kookheon
Issue Date
2001-10-01
Publisher
Taylor & Francis
Citation
Mol. Cryst. Liq. Cryst., 371, 119
Keywords
Methylsilsesquioxane (MSSQ)nanoporositydielectric constantthin filmcopolymeriationdehydroxylation
Abstract
Two types of methylsilsesquioxanes (MSSQ) were used as base matrix materials for nanoporous films. The hydrophilicity of MSSQ was controlled by copolymerization for the improved miscibility between MSSQs and star-shaped poly(caprolactone) (PCL) as a porogen. Linear relationship holds between porosity/refractive index and vol% of porogen upto 30%. Dielectric constant of porous MSSQ film could be reduced to 2.2 at the porosity of 30 vol%. Dielectric constant was very sensitive to the content of hydroxyl group of MSSQ and the the latter was reduced by treating surface silanols with hexamethyldisilazane
ISSN
1542-1406 (print)
1563-5287 (online)
Language
English
URI
http://hdl.handle.net/10371/5858
DOI
https://doi.org/10.1080/10587250108024702
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Chemical and Biological Engineering (화학생물공학부)Journal Papers (저널논문_화학생물공학부)
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