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A Micromachined Silicon Depth Probe for Multichannel Neural Recording
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Cited 88 time in Scopus
- Authors
- Issue Date
- 2000-08
- Citation
- IEEE Trans. Biomed. Eng., vol. 47, pp. 1082-1087, Aug. 2000
- Keywords
- Mechanical stress test ; multichannel simultaneous recording ; neural probes ; plasma etch ; silicon microelectrode array
- Abstract
- Aprocess of making a new type of silicon depth-probe
microelectrode array is described using a combination of plasma
and wet etch. The plasma etch, which is done using a low temperature
oxide (LTO) mask, enables probe thickness to be controlled
over a range from 5 to 90 . Bending tests show that the probes
mechanical strength depends largely on shank thickness. More
force can be applied to thicker shanks while thinner shanks are
more flexible. One can then choose a thickness and corresponding
mechanical strength using the process developed. The entire
probe shaping process is performed only at low temperature,
and thus is consistent with the standard CMOS fabrication.
Using the probe in recording from rats somatosensory cortex,
we obtained four channel simultaneous recordings which showed
clear independence among channels with a signal-to-noise ratio
performance comparable with that obtained using other devices.
- ISSN
- 0018-9294
- Language
- English
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