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Issue Date	Title / Author(s) / Citation	File	Altmetrics
2022-02	Phenomenology-based model predictive control of electron density in Ar/SF6 capacitively coupled etch plasma Ryu, Sangwon; Kwon, Ji-Won; Lee, Ingyu; Park, Jihoon; Kim, Gon-Ho Journal of the Korean Physical Society, Vol.80 No.3, pp.233-240	DOI
2022-04	Development of model predictive control of fluorine density in SF6/O2/Ar etch plasma by oxygen flow rate Ryu, Sangwon; Kwon, Ji-Won; Park, Jihoon; Lee, Ingyu; Park, Seolhye; Kim, Gon-Ho Current Applied Physics, Vol.36, pp.183-186	DOI