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Deposition and characterization of low-k SiOC:H dielectrics and its compatibility with Ruthenium as metal barrier : SiOC:H 저유전 박막의 특성 개선과 Ru 금속 확산 방지막과의 연관성에 관한 연구
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- Authors
- Advisor
- 김형준
- Issue Date
- 2008
- Publisher
- 서울대학교 대학원
- Keywords
- 저유전박막 ; Low-k ; 유전상수 ; Dielectric constant ; X-선 반사율 ; X-ray Reflectivity (XRR) ; UV 오존 ; Ultraviolet-assisted ozone (UV-O3) ; 루세늄 ; Ruthenium ; 원자층 증착 ; Atomic layer deposition (ALD) ; 확산 방지막 ; Diffusion barrier
- Description
- Thesis(doctors) --서울대학교 대학원 :재료공학부,2008.8.
- Language
- English
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000041535
https://hdl.handle.net/10371/12647
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