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College of Engineering/Engineering Practice School (공과대학/대학원)
Dept. of Material Science and Engineering (재료공학부)
Theses (Ph.D. / Sc.D._재료공학부)
Preparation of the thin films by inductively coupled plasma assisted chemical vapor deposition and diagnostics of inductively coupled plasma
유도결합 플라즈마 특성 분석 및 유도결합 플라즈마 화학기상증착법을 이용한 박막 증착
- Authors
- 이동각
- Advisor
- 이정중
- Issue Date
- 2004
- Publisher
- 서울대학교 대학원
- Keywords
- 유도결합플라즈마; Inductively Coupled Plasma(ICP); 플라즈마 분석; Plasma Diagnostics; 이온 에너지 분석; Ion Energy Analysis; 화학적 기상증착법; Chemical Vapor Deposition(CVD); 경질피막; Hard Coatings; Carbon Nitride; Carbon Nitride; Titanium Nitride; Titanium Nitride; 저온 증착.; low temperature deposition
- Description
- Thesis(doctoral)--서울대학교 대학원 :재료공학부,2004.
- Language
- English
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000056738
http://hdl.handle.net/10371/12692
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