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Manipulation in Shape and Arrangement of Nano Pattern Using Stretched Soft Molds
소프트 몰드 연신을 통한 나노패턴의 모양과 배열의 제어

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Authors
홍나영
Advisor
이종찬
Major
공과대학 화학생물공학부
Issue Date
2013-02
Publisher
서울대학교 대학원
Keywords
"stretching""AAO""ellipsoid""poly(dimethylsiloaxane)""anisotropic wetting""hexagonal"
Description
학위논문 (석사)-- 서울대학교 대학원 : 화학생물공학부, 2013. 2. 이종찬.
Abstract
Various methods for soft lithography have been developed due to the temporal and economical limitations of photo lithography, and still a lot of lithographical methods are being developed and studied to apply to different scientific fields. Here, we focus on nano-scale anisotropic patterns formed from a replica molding with curable polymers. We fabricate a stamp having an array of the patterns newly formed from a hexagonal pattern of tens of nanometers composed of dot-shaped vertices. We could successfully transform the dot-patterned feature to an ellipsoidal one and also manipulate its aspect ratio as desired. Furthermore, we were able to stretch the hexagonal pattern while keeping the dot shape the same, so we came up with a new pattern arrangement. Ultimately, we can notice the change in wetting property of materials having anisotropic structures.
Language
English
URI
https://hdl.handle.net/10371/127045
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Chemical and Biological Engineering (화학생물공학부)Theses (Master's Degree_화학생물공학부)
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