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Detailed Information
Photo-sensitive epoxy system and copper complexed methacrylate polymer; BARC, E-beam lithography and biocidal applications : 감광성 에폭시 시스템과 구리 함유 아크릴 고분자; 반사방지막, 전자빔 리소그래피와 항균물질로의 응용
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- Authors
- Advisor
- 이종찬
- Issue Date
- 2009
- Publisher
- 서울대학교 대학원
- Keywords
- 포토리소그래피 ; photo lithography ; 가교반응 ; Crosslinking ; 카보네이트 ; Carbonate ; 구리 착화합물 ; Copper complex ; 나노그물구조 ; Nanonetwork ; 전자빔 리소그래피 ; Electron beam lithography ; 항균성 ; Biocidal activity.
- Description
- Thesis(doctors) --서울대학교 대학원 :화학생물공학부,2009.2.
- Language
- English
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000036104
https://hdl.handle.net/10371/12990
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