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Atomic layer deposition of high-k HfO2 using Hf(O-iPr)4 and Hf(NMe2)4 as Hf precursors
Hf(O-iPr)4 와 Hf(NMe2)4를 Hf 전구체로 사용한 고유전 HfO2의 원자층증착

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  • mendeley

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