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Property improvement of the Ruthenium thin films deposited by metal-organic chemical vapor deposition for the electrodes of the DRAM devices
DRAM 소자의 전극 물질로의 적용을 위해 유기화학기상 증착법으로 증착한 Ru 박막의 특성 개선에 관한 연구

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Authors
김범석
Advisor
김형준
Issue Date
2008
Publisher
서울대학교 대학원
Keywords
RuRu유기금속화학기상증착MOCVDDRAMDRAM핵생성nucleation일함수work functionagglomerationagglomeration
Description
Thesis(doctors) --서울대학교 대학원 :재료공학부, 2008.2.
Language
English
URI
http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000039488

https://hdl.handle.net/10371/13208
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Material Science and Engineering (재료공학부) Theses (Ph.D. / Sc.D._재료공학부)
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