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Property improvement of the Ruthenium thin films deposited by metal-organic chemical vapor deposition for the electrodes of the DRAM devices : DRAM 소자의 전극 물질로의 적용을 위해 유기화학기상 증착법으로 증착한 Ru 박막의 특성 개선에 관한 연구
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- Authors
- Advisor
- 김형준
- Issue Date
- 2008
- Publisher
- 서울대학교 대학원
- Keywords
- Ru ; Ru ; 유기금속화학기상증착 ; MOCVD ; DRAM ; DRAM ; 핵생성 ; nucleation ; 일함수 ; work function ; agglomeration ; agglomeration
- Description
- Thesis(doctors) --서울대학교 대학원 :재료공학부, 2008.2.
- Language
- English
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000039488
https://hdl.handle.net/10371/13208
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