Publications
Detailed Information
Deposition and property improvement of high-k dielectric materials for gate oxide of CMOS devices : CMOS 소자의 gate oxide용 고유전 유전막의 증착과 특성 개선에 관한 연구
Cited 0 time in
Web of Science
Cited 0 time in Scopus
- Authors
- Advisor
- 김형준
- Issue Date
- 2008
- Publisher
- 서울대학교 대학원
- Keywords
- high-κ ; high-κ ; ALD ; ALD ; Al2O3 ; Al2O3 ; AlN ; AlN ; La2O3 ; La2O3 ; LaAlO3 ; LaAlO3 deposition behavior ; 증착거동 ; UV treatment ; UV 처리 ; leakage current mechanism ; 전도기구 ; thermal stability ; 열적 안정성 ; XPS ; XPS
- Description
- Thesis(doctors) --서울대학교 대학원 :재료공학부,2008.8.
- Language
- English
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000041526
https://hdl.handle.net/10371/13510
- Files in This Item:
- There are no files associated with this item.
Item View & Download Count
Items in S-Space are protected by copyright, with all rights reserved, unless otherwise indicated.