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Study on atomic layer deposited high-k HfO₂ film and reliability problem based on chlorine carbon residue

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Authors
조문주
Advisor
황철성
Issue Date
2007
Publisher
서울대학교 대학원
Keywords
HfO₂ALCVD (ALD)high-kChlorinecarbonTDDBcharge pumping
Description
학위논문(박사) --서울대학교 대학원 :재료공학부,2007.
Language
English
URI
http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000042941

http://hdl.handle.net/10371/13527
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Material Science and Engineering (재료공학부) Theses (Ph.D. / Sc.D._재료공학부)
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