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Detailed Information
Study on atomic layer deposited high-k HfO₂ film and reliability problem based on chlorine carbon residue
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- Authors
- Advisor
- 황철성
- Issue Date
- 2007
- Publisher
- 서울대학교 대학원
- Keywords
- HfO₂ ; ALCVD (ALD) ; high-k ; Chlorine ; carbon ; TDDB ; charge pumping
- Description
- 학위논문(박사) --서울대학교 대학원 :재료공학부,2007.
- Language
- English
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000042941
https://hdl.handle.net/10371/13527
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