S-Space College of Engineering/Engineering Practice School (공과대학/대학원) Dept. of Materials Science and Engineering (재료공학부) Theses (Ph.D. / Sc.D._재료공학부)
New materials in advanced gate stacks for next generation complementary metal oxide semiconductor field effect transistors(CMOSFETs) technology
- Issue Date
- 서울대학교 대학원
- ALD; ALD; High-k; High-k; Metal gate; Metal gate; High mobility channel; High mobility channel; MOSFETs; MOSFETs
- Thesis(doctors)--서울대학교 대학원 :재료공학부,2008.2.
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