Publications
Detailed Information
New materials in advanced gate stacks for next generation complementary metal oxide semiconductor field effect transistors(CMOSFETs) technology
Cited 0 time in
Web of Science
Cited 0 time in Scopus
- Authors
- Advisor
- 황철성
- Issue Date
- 2008
- Publisher
- 서울대학교 대학원
- Keywords
- ALD ; ALD ; High-k ; High-k ; Metal gate ; Metal gate ; High mobility channel ; High mobility channel ; MOSFETs ; MOSFETs
- Description
- Thesis(doctors)--서울대학교 대학원 :재료공학부,2008.2.
- Language
- English
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000039480
https://hdl.handle.net/10371/13567
- Files in This Item:
- There are no files associated with this item.
Item View & Download Count
Items in S-Space are protected by copyright, with all rights reserved, unless otherwise indicated.