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Chemical vapor deposition of silicon thin film by hot-wire method : the charge effect approach : 열 필라멘트법에 의한 실리콘박막 화학기상증착에서의 전하효과
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- Authors
- Advisor
- 황농문
- Issue Date
- 2007
- Publisher
- 서울대학교 대학원
- Keywords
- 실리콘 ; Silicon Thin Film ; 박막증착 ; Hot-wire CVD ; 열 필라멘트 ; Gas Phase ; 전하 ; Charge ; 나노입자 ; Nanoparticle ; 쌍정 ; Twin ; Surface Roughness
- Description
- 학위논문(박사) --서울대학교 대학원 :재료공학부,2007.
- Language
- English
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000042938
https://hdl.handle.net/10371/13589
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