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Deposition behavior and phase change characteristics of Ge2Sb2Te5 thin films for phase change memory application : 상변화메모리 적용을 위한 Ge2Sb2Te5 박막의 증착 거동과 상변화 특성

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dc.contributor.advisor황철성-
dc.contributor.author최병준-
dc.date.accessioned2009-11-19T05:02:53Z-
dc.date.available2009-11-19T05:02:53Z-
dc.date.copyright2009.-
dc.date.issued2009-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000035984eng
dc.identifier.urihttps://hdl.handle.net/10371/13633-
dc.descriptionThesis(doctors) --서울대학교 대학원 :재료공학부,2009.2.eng
dc.format.extentxiii, 171 p.eng
dc.language.isoeneng
dc.publisher서울대학교 대학원eng
dc.subjectGe2Sb2Te5 (GST)eng
dc.subjectGe2Sb2Te5 (GST)eng
dc.subject플라스마 강화 화학기상 증착법 (PECVD)eng
dc.subjectPlasma enhanced chemical vapor deposition (PECVD)eng
dc.subject플라스마 강화 원자층 증착법 (PEALD)eng
dc.subjectPlasma enhanced atomic layer deposition (PEALD)eng
dc.subject선택적 성장 (selective growth)eng
dc.subjectSelective CVDeng
dc.subject상변화 메모리 (PRAM)eng
dc.subjectPRAMeng
dc.subjectthermal barrier layereng
dc.titleDeposition behavior and phase change characteristics of Ge2Sb2Te5 thin films for phase change memory applicationeng
dc.title.alternative상변화메모리 적용을 위한 Ge2Sb2Te5 박막의 증착 거동과 상변화 특성eng
dc.typeThesis-
dc.contributor.department재료공학부-
dc.description.degreeDoctoreng
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