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Gate oxide로 사용될 CVD-HfxAlyO 박막의 전기적 특성 개선

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Authors
최지훈
Advisor
김형준
Issue Date
2004
Publisher
서울대학교 대학원
Keywords
HfAlOHfalogate oxideGate oxideCVDCvdHRTEMHrtemXPSXpsHF cleaningHf cleaning
Description
학위논문(석사)--서울대학교 대학원 :재료공학부,2004.
Language
Korean
URI
http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000055527

https://hdl.handle.net/10371/14338
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Material Science and Engineering (재료공학부) Theses (Master's Degree_재료공학부)
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