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원자층 증착법을 이용한 반도체 구리배선을 위한 WNxCy 확산방지막의 특성 분석에 관한 연구
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- Authors
- Advisor
- 김기범
- Issue Date
- 2004
- Publisher
- 서울대학교 대학원
- Keywords
- 확산방지막 ; Diffusion barrier ; 원자층 증착법 ; Atomic layer deposition ; WNxCy ; Wnxcy ; 투과전자현미경 ; Transmission electron microscopy (tem) ; 미세구조 ; Microstructure
- Description
- 학위논문(석사)--서울대학교 대학원 :재료공학부,2004.
- Language
- Korean
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000054932
https://hdl.handle.net/10371/14350
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