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ALD로 증착한 HfO₂ stack의 성장거동과 전기적 특성에 대한 연구

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Authors
조문주
Advisor
황철성
Issue Date
2003
Publisher
서울대학교 대학원
Keywords
HfO2Gate oxideALDHRTEMXRD
Description
학위논문(석사)--서울대학교 대학원 :재료공학부,2003.
Language
Korean
URI
http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000058285

http://hdl.handle.net/10371/14665
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Material Science and Engineering (재료공학부) Theses (Master's Degree_재료공학부)
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