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DRAM에 응용되는 이산화티타늄을 기반으로 한 산화박막의 증착거동 및 유전특성 개선에 관한 연구
Improvements in deposition behavior and dielectric properties of TiO2 based oxide films for dynamic random access memory applications

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Authors
최규진
Advisor
황철성
Issue Date
2009
Publisher
서울대학교 대학원
Keywords
커패시터capacitorALDALDPEALDPEALDTiO2TiO2Al-doped TiO2Al-doped TiO2플라즈마plasmaRuRuTiNTiN
Description
학위논문(석사) --서울대학교 대학원 :재료공학부, 2009.2.
Language
Korean
URI
http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000036889

https://hdl.handle.net/10371/14967
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Material Science and Engineering (재료공학부) Theses (Master's Degree_재료공학부)
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