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단원자 증착법(ALD)으로 증착한 HfO₂박막의 구조적 전기적 특성 연구

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Authors
서민하
Advisor
황철성
Issue Date
2006
Publisher
서울대학교 대학원
Keywords
HfO2SiNALDcrystallizationSIMS
Description
학위논문(석사)--서울대학교 대학원 :재료공학부,2006.
Language
Korean
URI
http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000047500

https://hdl.handle.net/10371/15003
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Materials Science and Engineering (재료공학부)Theses (Master's Degree_재료공학부)
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