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College of Engineering/Engineering Practice School (공과대학/대학원)
Dept. of Material Science and Engineering (재료공학부)
Theses (Master's Degree_재료공학부)
(The) microstructure and the properties of TaNx diffusion barrier deposited by inductively coupled plasma assisted sputtering
- Authors
- 김성만
- Advisor
- 이정중
- Issue Date
- 2008
- Publisher
- 서울대학교 대학원
- Keywords
- 탄탈룸 나이트라이드; tantalum nitride (TaNx); 유도결합 플라즈마; inductively coupled plasma (ICP); 확산방지막; diffusion barrier; 비정질; amorphous; 미세구조; microstructure
- Description
- Thesis(masters) --서울대학교 대학원 :재료공학부,2008.2.
- Language
- English
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000041104
http://hdl.handle.net/10371/15022
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