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PECVD법에 의해 증착 된 비정질 실리콘의 결정화와 다결정 실리콘 박막 트랜지스터의 제작 : The crystallization of Amorphous-Silicon deposited by PECVD and its Polycrystalline-Silicon Thin Film Transistors

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Authors

윤은애

Advisor
주승기
Major
재료공학부
Issue Date
2011-02
Publisher
서울대학교 대학원
Keywords
금속유도측면결정화다결정 실리콘 박막 트랜지스터MILCMetal Induced Lateral Crystallizationpolycrystalline silicon thin film transistorPECVD a-Si:HDehydrogenation
Description
학위논문 (석사)-- 서울대학교 대학원 : 재료공학부, 2011.2. 주승기.
Language
kor
URI
https://hdl.handle.net/10371/159490

http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000029780
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