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A Comparative Study on the Ferroelectric Performances in Atomic Layer Deposited Hf0.5Zr0.5O2 Thin Films Using Tetrakis(ethylmethylamino) and Tetrakis(dimethylamino) Precursors
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Baek S | - |
dc.contributor.author | Hyun, Seung D | - |
dc.contributor.author | Moon, Taehwan | - |
dc.contributor.author | Do Kim, Keum | - |
dc.contributor.author | Lee, Young H | - |
dc.contributor.author | Park, Hyeon W | - |
dc.contributor.author | Lee, Yong B | - |
dc.contributor.author | Roh, Jangho | - |
dc.contributor.author | Kim, Beom Y | - |
dc.contributor.author | Kim, Ho H | - |
dc.contributor.author | Park, Min H | - |
dc.contributor.author | Hwang, Cheol S | - |
dc.date.accessioned | 2020-09-09T05:26:32Z | - |
dc.date.available | 2020-09-09T05:26:32Z | - |
dc.date.issued | 2020-04-07 | - |
dc.identifier.citation | Nanoscale Research Letters. 2020 Apr 07;15(1):72 | - |
dc.identifier.uri | https://doi.org/10.1186/s11671-020-03301-4 | - |
dc.identifier.uri | https://hdl.handle.net/10371/168829 | - |
dc.description.abstract | Abstract
The chemical, physical, and electrical properties of the atomic layer deposited Hf0.5Zr0.5O2 thin films using tetrakis(ethylmethylamino) (TEMA) and tetrakis(dimethylamino) (TDMA) precursors are compared. The ligand of the metal-organic precursors strongly affects the residual C concentration, grain size, and the resulting ferroelectric properties. Depositing Hf0.5Zr0.5O2 films with the TDMA precursors results in lower C concentration and slightly larger grain size. These findings are beneficial to grow more ferroelectric-phase-dominant film, which mitigates its wake-up effect. From the wake-up test of the TDMA-Hf0.5Zr0.5O2 film with a 2.8 MV/cm cycling field, the adverse wake-up effect was well suppressed up to 105 cycles, with a reasonably high double remanent polarization value of ~40 μC/cm2. The film also showed reliable switching up to 109 cycles with the 2.5MV/cm cycling field without involving the wake-up effect but with the typical fatigue behavior. | - |
dc.title | A Comparative Study on the Ferroelectric Performances in Atomic Layer Deposited Hf0.5Zr0.5O2 Thin Films Using Tetrakis(ethylmethylamino) and Tetrakis(dimethylamino) Precursors | - |
dc.type | Journal Article | - |
dc.language.rfc3066 | en | - |
dc.rights.holder | The Author(s) | - |
dc.date.updated | 2020-06-17T13:22:52Z | - |
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