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Thermal stability of metal Ohmic contacts in indium gallium zinc oxide transistors using a graphene barrier layer

Cited 32 time in Web of Science Cited 34 time in Scopus
Authors

Lee, Jeong Eun; Sharma, Bhupendra K.; Lee, Seoung-Ki; Jeon, Haseok; Hong, Byung Hee; Lee, Hoo-Jeong; Ahn, Jong-Hyun

Issue Date
2013-03
Publisher
American Institute of Physics
Citation
Applied Physics Letters, Vol.102 No.11, p. 113112
Abstract
The excellent impermeability of graphene was exploited to produce stable ohmic contact at the interface between Al metal and a semiconducting indium gallium zinc oxide (IGZO) layer after high-temperature annealing. Thin film transistors (TFTs) were fabricated with and without a graphene interlayer between the Al metal and the IGZO channel region. Metal contact at the interface prepared without a graphene interlayer showed serious instabilities in the IGZO TFT under thermal annealing; however, the insertion of a graphene interlayer between the IGZO channel and the Al metal offered good stability under repeated high-temperature annealing cycles and maintained ohmic contact. (C) 2013 American Institute of Physics. [http://dx.doi.org/10.1063/1.4796174]
ISSN
0003-6951
URI
https://hdl.handle.net/10371/172165
DOI
https://doi.org/10.1063/1.4796174
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  • College of Natural Sciences
  • Department of Chemistry
Research Area Physics

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