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Low frequency noise characteristics in multilayer WSe2 field effect transistor

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dc.contributor.authorCho, In-Tak-
dc.contributor.authorKim, Jong In-
dc.contributor.authorHong, Yoonki-
dc.contributor.authorRoh, Jeongkyun-
dc.contributor.authorShin, Hyeonwoo-
dc.contributor.authorBaek, Geun Woo-
dc.contributor.authorLee, Changhee-
dc.contributor.authorHong, Byung Hee-
dc.contributor.authorJin, Sung Hun-
dc.contributor.authorLee, Jong-Ho-
dc.date.accessioned2021-01-31T08:29:29Z-
dc.date.available2021-01-31T08:29:29Z-
dc.date.created2018-08-28-
dc.date.created2018-08-28-
dc.date.issued2015-01-
dc.identifier.citationApplied Physics Letters, Vol.106 No.2, p. 023504-
dc.identifier.issn0003-6951-
dc.identifier.other47589-
dc.identifier.urihttps://hdl.handle.net/10371/172168-
dc.description.abstractThis paper investigates the low-frequency noise properties of multilayer WSe2 field effect transistors (FETs) in subthreshold, linear, and saturation regime. The measured noise power spectral density of drain current (S-ID) shows that the low-frequency noise in multilayer WSe2 FET fits well to a 1/f(gamma) power law with gamma similar to 1 in the frequency range of 10 Hz-200 Hz. From the dependence of S-ID on the drain current, carrier mobility fluctuation is considered as a dominant low frequency noise mechanism from all operation regimes in multilayer WSe2 FET. Extracted Hooge's parameter in this study is within the value of 0.12, comparable to those of the transition metal dichalcogenide FETs in recent reports. (C) 2015 AIP Publishing LLC.-
dc.language영어-
dc.publisherAmerican Institute of Physics-
dc.titleLow frequency noise characteristics in multilayer WSe2 field effect transistor-
dc.typeArticle-
dc.contributor.AlternativeAuthor홍병희-
dc.identifier.doi10.1063/1.4906141-
dc.citation.journaltitleApplied Physics Letters-
dc.identifier.wosid000348054700096-
dc.identifier.scopusid2-s2.0-84923852931-
dc.citation.number2-
dc.citation.startpage023504-
dc.citation.volume106-
dc.identifier.sci000348054700096-
dc.description.isOpenAccessN-
dc.contributor.affiliatedAuthorLee, Changhee-
dc.contributor.affiliatedAuthorHong, Byung Hee-
dc.contributor.affiliatedAuthorLee, Jong-Ho-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.subject.keywordPlusMONOLAYER MOS2-
dc.subject.keywordPlusLAYER MOS2-
dc.subject.keywordPlus1/F NOISE-
dc.subject.keywordPlusMOBILITY-
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  • Department of Chemistry
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