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Highly Efficient Self-Curing Method in MOSFET Using Parasitic Bipolar Junction Transistor

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dc.contributor.authorShin, Wonjun-
dc.contributor.authorKoo, Ryun-Han-
dc.contributor.authorHong, Seongbin-
dc.contributor.authorKwon, Dongseok-
dc.contributor.authorHwang, Joon-
dc.contributor.authorPark, Byung-Gook-
dc.contributor.authorLee, Jong-Ho-
dc.date.accessioned2022-10-05T04:10:17Z-
dc.date.available2022-10-05T04:10:17Z-
dc.date.created2022-07-27-
dc.date.issued2022-07-
dc.identifier.citationIEEE Electron Device Letters, Vol.43 No.7, pp.1001-1004-
dc.identifier.issn0741-3106-
dc.identifier.urihttps://hdl.handle.net/10371/185316-
dc.description.abstract© 1980-2012 IEEE.We propose a hybrid self-curing method based on the parasitic bipolar junction transistor (PBJT) inherent to metal-oxide-semiconductor field-effect transistor (MOSFET). The PBJT utilizes the positive feedback of impact ionization to flow a large current close to the channel, generating Joule heat. Unlike conventional self-curing methods, the PBJT-based self-curing recovers the damaged gate oxide along the lateral dimension of the entire channel. The effects of the hybrid curing are quantitatively verified by low-frequency noise spectroscopy and charge pumping method.-
dc.language영어-
dc.publisherInstitute of Electrical and Electronics Engineers-
dc.titleHighly Efficient Self-Curing Method in MOSFET Using Parasitic Bipolar Junction Transistor-
dc.typeArticle-
dc.identifier.doi10.1109/LED.2022.3176238-
dc.citation.journaltitleIEEE Electron Device Letters-
dc.identifier.wosid000838380800009-
dc.identifier.scopusid2-s2.0-85130427976-
dc.citation.endpage1004-
dc.citation.number7-
dc.citation.startpage1001-
dc.citation.volume43-
dc.description.isOpenAccessN-
dc.contributor.affiliatedAuthorPark, Byung-Gook-
dc.contributor.affiliatedAuthorLee, Jong-Ho-
dc.type.docTypeArticle-
dc.description.journalClass1-
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