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Triple-gate Tunnel FETs Encapsulated with an Epitaxial Layer for High Current Drivability

DC Field Value Language
dc.contributor.authorLee, Jang Woo-
dc.contributor.authorChoi, Woo Young-
dc.date.accessioned2022-10-26T07:21:22Z-
dc.date.available2022-10-26T07:21:22Z-
dc.date.created2022-10-20-
dc.date.issued2017-04-
dc.identifier.citationJOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE, Vol.17 No.2, pp.271-276-
dc.identifier.issn1598-1657-
dc.identifier.urihttps://hdl.handle.net/10371/186773-
dc.description.abstractThe triple-gate tunnel FETs encapsulated with an epitaxial layer (EL TFETs) is proposed to lower the subthreshold swing of the TFETs. Furthermore, the band-to-band tunneling based on the maximum electric-field can occur thanks to the epitaxial layer wrapping the Si fin. The performance and mechanism of the EL TFETs are compared with the previously proposed TFET based on simulation.-
dc.language영어-
dc.publisher대한전자공학회-
dc.titleTriple-gate Tunnel FETs Encapsulated with an Epitaxial Layer for High Current Drivability-
dc.typeArticle-
dc.identifier.doi10.5573/JSTS.2017.17.2.271-
dc.citation.journaltitleJOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE-
dc.identifier.wosid000406938600018-
dc.identifier.scopusid2-s2.0-85018737429-
dc.citation.endpage276-
dc.citation.number2-
dc.citation.startpage271-
dc.citation.volume17-
dc.identifier.kciidART002216909-
dc.description.isOpenAccessN-
dc.contributor.affiliatedAuthorChoi, Woo Young-
dc.type.docTypeArticle-
dc.description.journalClass1-
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