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Linearity of Hetero-Gate-Dielectric Tunneling Field-Effect Transistors

DC Field Value Language
dc.contributor.authorLee, Hyun Kook-
dc.contributor.authorChoi, Woo Young-
dc.date.accessioned2022-10-26T07:21:45Z-
dc.date.available2022-10-26T07:21:45Z-
dc.date.created2022-10-20-
dc.date.issued2013-12-
dc.identifier.citationJOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE, Vol.13 No.6, pp.551-555-
dc.identifier.issn1598-1657-
dc.identifier.urihttps://hdl.handle.net/10371/186806-
dc.description.abstractLinearity characteristics of hetero-gate-dielectric tunneling field-effect transistors (HG TFETs) have been compared with those of high-k-only and SiO2-only TFETs in terms of IIP3 and P1dB. It has been observed that the optimized HG TFETs have higher IIP3 and P1dB than high-k-only and SiO2-only TFETs. It is because HG TFETs show higher transconductance (g(m)) and current drivability than SiO2-only TFETs and g(m) less sensitive to gate voltage than high-k-only TFETs.-
dc.language영어-
dc.publisher대한전자공학회-
dc.titleLinearity of Hetero-Gate-Dielectric Tunneling Field-Effect Transistors-
dc.typeArticle-
dc.identifier.doi10.5573/JSTS.2013.13.6.551-
dc.citation.journaltitleJOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE-
dc.identifier.wosid000328936000003-
dc.identifier.scopusid2-s2.0-84890885225-
dc.citation.endpage555-
dc.citation.number6-
dc.citation.startpage551-
dc.citation.volume13-
dc.identifier.kciidART001829163-
dc.description.isOpenAccessN-
dc.contributor.affiliatedAuthorChoi, Woo Young-
dc.type.docTypeArticle-
dc.description.journalClass1-
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