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Design Guidelines for Gate-Normal Hetero-Gate-Dielectric (GHG) Tunnel Field-Effect Transistors (TFETs)

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dc.contributor.authorLee, Jang Woo-
dc.contributor.authorChoi, Woo Young-
dc.date.accessioned2022-10-26T07:23:00Z-
dc.date.available2022-10-26T07:23:00Z-
dc.date.created2022-10-19-
dc.date.issued2020-04-
dc.identifier.citationIEEE Access, Vol.8, pp.67617-67624-
dc.identifier.issn2169-3536-
dc.identifier.urihttps://hdl.handle.net/10371/186913-
dc.description.abstractA gate-normal hetero-gate-dielectric (GHG) tunnel field-effect transistor (TFET) and the guidelines for its design are proposed. The introduction of the HG structure into gate-normal TFETs improves device performance by lowering subthreshold swing (SS). It is confirmed that the SS of the proposed GHG TFET is successfully enhanced by suppressing the gate-diagonal tunneling current. Compared with conventional gate-normal TFETs, the final optimized GHG TFET improves the values of the point SS, effective SS, and on-current by 71 & x0025;, 15 & x0025;, and 2.4 times, respectively.-
dc.language영어-
dc.publisherInstitute of Electrical and Electronics Engineers Inc.-
dc.titleDesign Guidelines for Gate-Normal Hetero-Gate-Dielectric (GHG) Tunnel Field-Effect Transistors (TFETs)-
dc.typeArticle-
dc.identifier.doi10.1109/ACCESS.2020.2985125-
dc.citation.journaltitleIEEE Access-
dc.identifier.wosid000527416700004-
dc.identifier.scopusid2-s2.0-85084001143-
dc.citation.endpage67624-
dc.citation.startpage67617-
dc.citation.volume8-
dc.description.isOpenAccessN-
dc.contributor.affiliatedAuthorChoi, Woo Young-
dc.type.docTypeArticle-
dc.description.journalClass1-
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