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Design guideline of tunnel field-effect transistors (TFETs) considering negative differential transconductance (NDT)

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dc.contributor.authorLee, Jang Woo-
dc.contributor.authorChoi, Woo Young-
dc.date.accessioned2022-10-26T07:23:01Z-
dc.date.available2022-10-26T07:23:01Z-
dc.date.created2022-10-19-
dc.date.issued2020-01-
dc.identifier.citationSolid-State Electronics, Vol.163, p. 107659-
dc.identifier.issn0038-1101-
dc.identifier.urihttps://hdl.handle.net/10371/186915-
dc.description.abstractA gate-normal tunnel field-effect transistor (TFET) showing negative differential transconductance (NDT) and its design guideline are proposed. The introduction of the source depletion to the gate-normal TFETs leads to negative differential transconductance. It is also confirmed that the NDT of the proposed gate-normal TFET is successfully enhanced by modulating gate-induced source depletion effects.-
dc.language영어-
dc.publisherPergamon Press Ltd.-
dc.titleDesign guideline of tunnel field-effect transistors (TFETs) considering negative differential transconductance (NDT)-
dc.typeArticle-
dc.identifier.doi10.1016/j.sse.2019.107659-
dc.citation.journaltitleSolid-State Electronics-
dc.identifier.wosid000496807500014-
dc.identifier.scopusid2-s2.0-85072274702-
dc.citation.startpage107659-
dc.citation.volume163-
dc.description.isOpenAccessN-
dc.contributor.affiliatedAuthorChoi, Woo Young-
dc.type.docTypeArticle; Proceedings Paper-
dc.description.journalClass1-
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