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Hydrothermal growth of ZnO microstructures on Ar plasma treated graphite

DC Field Value Language
dc.contributor.authorKim, Yong-Jin-
dc.contributor.authorTukiman, Hadiyawarman-
dc.contributor.authorLee, Chul-Ho-
dc.contributor.authorKim, Sung-Soo-
dc.contributor.authorPark, Jinho-
dc.contributor.authorSohn, Byeong-Hyeok-
dc.contributor.authorKim, Miyoung-
dc.contributor.authorYi, Gyu-Chul-
dc.contributor.authorJung, Ranju-
dc.contributor.authorLiu, Chunli-
dc.date.accessioned2024-05-16T01:16:13Z-
dc.date.available2024-05-16T01:16:13Z-
dc.date.created2020-07-22-
dc.date.created2020-07-22-
dc.date.issued2014-03-
dc.identifier.citationCurrent Applied Physics, Vol.14 No.3, pp.269-274-
dc.identifier.issn1567-1739-
dc.identifier.urihttps://hdl.handle.net/10371/202328-
dc.description.abstractWe have investigated the effect of argon (Ar) plasma treatment on the surface of graphite and the hydrothermal growth of zinc oxide (ZnO) microstructures. With the plasma treatment, the growth behavior of ZnO microrods on the graphite substrates changed drastically. After the graphite surface was exposed to the Ar plasma, the number density of ZnO was one order of magnitude higher than that on the pristine graphite without plasma treatment. Raman spectroscopy revealed that Ar plasma treatment created the structural defects on the graphite surfaces and decreased the mean distance of defects. Surface characterization through atomic force microscopy and X-ray photoelectron spectroscopy showed that the graphite surface was roughened and that oxygenecarbon bonding was formed. The enhanced nucleation of ZnO can be explained by the generation of structural defects, surface roughness, and surface functional groups on the graphite substrate. Therefore, Ar plasma treatment can be used as a simple method to engineer the surface properties of graphite substrates and to control the crystal nucleation and growth of inorganic materials on their surface. (C) 2013 Elsevier B. V. All rights reserved.-
dc.language영어-
dc.publisher한국물리학회-
dc.titleHydrothermal growth of ZnO microstructures on Ar plasma treated graphite-
dc.typeArticle-
dc.identifier.doi10.1016/j.cap.2013.11.034-
dc.citation.journaltitleCurrent Applied Physics-
dc.identifier.wosid000331640600010-
dc.identifier.scopusid2-s2.0-84890826910-
dc.citation.endpage274-
dc.citation.number3-
dc.citation.startpage269-
dc.citation.volume14-
dc.identifier.kciidART001867882-
dc.description.isOpenAccessN-
dc.contributor.affiliatedAuthorLee, Chul-Ho-
dc.contributor.affiliatedAuthorSohn, Byeong-Hyeok-
dc.contributor.affiliatedAuthorKim, Miyoung-
dc.contributor.affiliatedAuthorYi, Gyu-Chul-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.subject.keywordPlusLIGHT-EMITTING-DIODES-
dc.subject.keywordPlusGRAPHENE-
dc.subject.keywordPlusNANOSTRUCTURES-
dc.subject.keywordPlusDEFECTS-
dc.subject.keywordPlusSURFACE-
dc.subject.keywordAuthorDefects-
dc.subject.keywordAuthorNucleation-
dc.subject.keywordAuthorZnO-
dc.subject.keywordAuthorMicrostructures-
dc.subject.keywordAuthorGraphite-
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  • College of Engineering
  • Department of Electrical and Computer Engineering
Research Area 2차원 반도체 소자 및 재료, High-Performance 2D Electronics, Low-Power 2D Electronics, 뉴로모픽 소자 및 응용기술, 저전력 소자 및 소자물리

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